{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "Kr+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Kr+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.0969, "q": 15.88, "mu": 1.909, "epsilonL": 1.608e-06, "Eth": 27.18}, "E_min": 27.18, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
27.18	5.765e-33	
32.13	0.0002018	
38.0	0.001054	
44.93	0.003175	
53.12	0.00761	
62.81	0.01599	
74.27	0.03067	
87.82	0.05458	
103.8	0.09077	
122.8	0.1414	
145.2	0.2066	
171.7	0.2843	
203.0	0.3708	
240.0	0.4625	
283.8	0.5565	
335.6	0.6519	
396.8	0.7484	
469.2	0.8469	
554.7	0.9482	
655.9	1.053	
775.6	1.163	
917.1	1.279	
1084.0	1.401	
1282.0	1.53	
1516.0	1.666	
1793.0	1.809	
2120.0	1.96	
2506.0	2.119	
2963.0	2.285	
3504.0	2.458	
4143.0	2.638	
4899.0	2.824	
5793.0	3.016	
6849.0	3.213	
8099.0	3.415	
9576.0	3.619	
11320.0	3.826	
13390.0	4.035	
15830.0	4.243	
18720.0	4.449	
22130.0	4.653	
26170.0	4.851	
30950.0	5.044	
36590.0	5.229	
43270.0	5.404	
51160.0	5.567	
60490.0	5.716	
71520.0	5.849	
84570.0	5.965	
-----