{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "Ar+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Ar+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.0841, "q": 7.284, "mu": 1.909, "epsilonL": 4.172e-06, "Eth": 23.68}, "E_min": 23.68, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
23.68	0.0	
28.08	0.0002503	
33.3	0.001311	
39.48	0.00395	
46.82	0.009421	
55.51	0.01957	
65.83	0.03672	
78.05	0.06321	
92.55	0.1005	
109.7	0.148	
130.1	0.2037	
154.3	0.264	
183.0	0.3262	
216.9	0.3885	
257.2	0.4502	
305.0	0.5118	
361.7	0.5738	
428.8	0.6368	
508.5	0.7016	
602.9	0.7687	
714.9	0.8385	
847.7	0.9113	
1005.0	0.9872	
1192.0	1.066	
1413.0	1.148	
1676.0	1.234	
1987.0	1.322	
2356.0	1.412	
2794.0	1.505	
3313.0	1.6	
3928.0	1.696	
4658.0	1.793	
5523.0	1.89	
6549.0	1.987	
7765.0	2.082	
9207.0	2.176	
10920.0	2.268	
12950.0	2.356	
15350.0	2.44	
18200.0	2.519	
21580.0	2.592	
25590.0	2.658	
30340.0	2.715	
35980.0	2.764	
42660.0	2.802	
50590.0	2.83	
59980.0	2.846	
71120.0	2.848	
84340.0	2.838	
-----