{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1695, "q": 0.123, "mu": 1.73, "epsilonL": 5.084e-05, "Eth": 84.56}, "E_min": 84.56, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
84.56	0.0	
97.7	8.759e-05	
112.9	0.0003764	
130.4	0.0009721	
150.7	0.002013	
174.1	0.003642	
201.1	0.005953	
232.4	0.008934	
268.5	0.01244	
310.2	0.01622	
358.3	0.01999	
414.0	0.02354	
478.3	0.02676	
552.6	0.0296	
638.5	0.0321	
737.6	0.0343	
852.2	0.03625	
984.6	0.03798	
1138.0	0.03955	
1314.0	0.04097	
1518.0	0.04225	
1754.0	0.04341	
2027.0	0.04445	
2342.0	0.04537	
2705.0	0.04617	
3126.0	0.04684	
3611.0	0.04737	
4172.0	0.04776	
4820.0	0.048	
5569.0	0.04809	
6434.0	0.04801	
7434.0	0.04776	
8589.0	0.04735	
9923.0	0.04676	
11460.0	0.046	
13250.0	0.04507	
15300.0	0.04398	
17680.0	0.04274	
20430.0	0.04137	
23600.0	0.03987	
27270.0	0.03827	
31500.0	0.03658	
36390.0	0.03483	
42050.0	0.03302	
48580.0	0.03119	
56130.0	0.02935	
64840.0	0.02751	
74920.0	0.02571	
86550.0	0.02393	
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