{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.605, "q": 0.0106, "mu": 1.38, "epsilonL": 0.000105, "Eth": 321}, "E_min": 321, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
321.0	0.0	
360.9	2.227e-05	
405.7	6.963e-05	
456.2	0.0001453	
512.9	0.0002555	
576.7	0.0004062	
648.3	0.0006021	
728.9	0.0008444	
819.6	0.00113	
921.5	0.001449	
1036.0	0.001789	
1165.0	0.002133	
1310.0	0.002466	
1472.0	0.002774	
1655.0	0.003048	
1861.0	0.003283	
2093.0	0.003477	
2353.0	0.003633	
2645.0	0.003752	
2974.0	0.003839	
3344.0	0.003898	
3760.0	0.003931	
4227.0	0.003942	
4752.0	0.003933	
5343.0	0.003907	
6007.0	0.003865	
6754.0	0.003809	
7594.0	0.003741	
8538.0	0.003662	
9599.0	0.003573	
10790.0	0.003475	
12130.0	0.00337	
13640.0	0.003259	
15340.0	0.003142	
17250.0	0.00302	
19390.0	0.002896	
21800.0	0.002769	
24510.0	0.002641	
27560.0	0.002513	
30980.0	0.002385	
34830.0	0.002258	
39160.0	0.002133	
44030.0	0.002011	
49510.0	0.001891	
55660.0	0.001776	
62580.0	0.001664	
70360.0	0.001556	
79110.0	0.001453	
88940.0	0.001354	
-----