{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Tm", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Tm(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.3646, "q": 0.0525, "mu": 1.668, "epsilonL": 0.000111, "Eth": 119.4}, "E_min": 119.4, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
119.4	2.899e-29	
137.0	5.437e-05	
157.1	0.0002199	
180.3	0.0005452	
206.8	0.001095	
237.3	0.001938	
272.2	0.003122	
312.3	0.004651	
358.3	0.006462	
411.0	0.008434	
471.5	0.01042	
541.0	0.01229	
620.6	0.01395	
712.0	0.01537	
816.8	0.01656	
937.1	0.01753	
1075.0	0.01831	
1233.0	0.01893	
1415.0	0.01943	
1623.0	0.01981	
1862.0	0.02009	
2136.0	0.02028	
2451.0	0.02039	
2812.0	0.02042	
3226.0	0.02037	
3701.0	0.02025	
4246.0	0.02005	
4871.0	0.01979	
5588.0	0.01945	
6411.0	0.01906	
7355.0	0.0186	
8438.0	0.01808	
9680.0	0.01751	
11110.0	0.01689	
12740.0	0.01624	
14620.0	0.01555	
16770.0	0.01483	
19240.0	0.0141	
22070.0	0.01336	
25320.0	0.01261	
29050.0	0.01186	
33330.0	0.01113	
38230.0	0.0104	
43860.0	0.009697	
50320.0	0.009015	
57730.0	0.008358	
66230.0	0.007729	
75980.0	0.00713	
87170.0	0.006562	
-----