{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "In", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on In(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.476, "q": 0.0408, "mu": 1.775, "epsilonL": 0.0001735, "Eth": 77.61}, "E_min": 77.61, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
77.61	0.0	
89.82	3.044e-05	
104.0	0.0001362	
120.3	0.0003628	
139.2	0.0007731	
161.2	0.001439	
186.5	0.002418	
215.9	0.003723	
249.8	0.005294	
289.2	0.007003	
334.7	0.008693	
387.3	0.01024	
448.3	0.01156	
518.8	0.01265	
600.5	0.01352	
695.0	0.01421	
804.3	0.01474	
930.9	0.01515	
1077.0	0.01545	
1247.0	0.01567	
1443.0	0.0158	
1670.0	0.01586	
1933.0	0.01586	
2237.0	0.01578	
2589.0	0.01565	
2997.0	0.01544	
3469.0	0.01518	
4014.0	0.01486	
4646.0	0.01449	
5377.0	0.01406	
6224.0	0.01359	
7203.0	0.01308	
8337.0	0.01253	
9648.0	0.01196	
11170.0	0.01136	
12920.0	0.01075	
14960.0	0.01014	
17310.0	0.009518	
20040.0	0.008905	
23190.0	0.008302	
26840.0	0.007713	
31060.0	0.007143	
35950.0	0.006594	
41610.0	0.00607	
48160.0	0.005573	
55730.0	0.005102	
64500.0	0.00466	
74650.0	0.004247	
86400.0	0.003861	
-----