{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Rh", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Rh(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.248, "q": 21.6, "mu": 2.316, "epsilonL": 1.134e-06, "Eth": 34.98}, "E_min": 34.98, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
34.98	0.0	
41.14	4.487e-05	
48.4	0.0003192	
56.93	0.00117	
66.97	0.003269	
78.78	0.007854	
92.68	0.01707	
109.0	0.03433	
128.2	0.06446	
150.9	0.113	
177.5	0.1846	
208.8	0.2797	
245.6	0.394	
288.9	0.5195	
339.8	0.649	
399.8	0.7777	
470.2	0.9045	
553.2	1.03	
650.7	1.157	
765.5	1.287	
900.5	1.421	
1059.0	1.562	
1246.0	1.71	
1466.0	1.866	
1724.0	2.031	
2028.0	2.206	
2386.0	2.39	
2807.0	2.585	
3302.0	2.789	
3884.0	3.003	
4569.0	3.226	
5375.0	3.458	
6323.0	3.699	
7438.0	3.948	
8749.0	4.204	
10290.0	4.466	
12110.0	4.733	
14240.0	5.004	
16750.0	5.278	
19710.0	5.553	
23180.0	5.827	
27270.0	6.098	
32080.0	6.366	
37740.0	6.628	
44390.0	6.881	
52220.0	7.124	
61430.0	7.354	
72270.0	7.57	
85010.0	7.767	
-----