{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Rh", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on Rh(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1038, "q": 0.2212, "mu": 2.074, "epsilonL": 9.222e-05, "Eth": 49.02}, "E_min": 49.02, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
49.02	2.05e-35	
57.26	0.0001703	
66.9	0.0009676	
78.16	0.002948	
91.31	0.006732	
106.7	0.01265	
124.6	0.02031	
145.6	0.0287	
170.1	0.03671	
198.7	0.04371	
232.2	0.04958	
271.2	0.05448	
316.9	0.05864	
370.2	0.06227	
432.5	0.06551	
505.2	0.06845	
590.3	0.07116	
689.6	0.07367	
805.6	0.07598	
941.2	0.07811	
1100.0	0.08003	
1285.0	0.08174	
1501.0	0.08323	
1753.0	0.08446	
2048.0	0.08542	
2393.0	0.08609	
2796.0	0.08645	
3266.0	0.08648	
3816.0	0.08617	
4458.0	0.08551	
5208.0	0.08449	
6084.0	0.08311	
7108.0	0.08139	
8304.0	0.07932	
9701.0	0.07695	
11330.0	0.07428	
13240.0	0.07137	
15470.0	0.06824	
18070.0	0.06493	
21110.0	0.0615	
24670.0	0.05798	
28820.0	0.05441	
33670.0	0.05085	
39330.0	0.04732	
45950.0	0.04387	
53680.0	0.04051	
62710.0	0.03727	
73270.0	0.03418	
85600.0	0.03124	
-----