{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Rh", "surface_phase": "pc", "species": {"text": "T+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of T+ on Rh(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.351, "q": 0.1026, "mu": 1.451, "epsilonL": 0.0001901, "Eth": 61.92}, "E_min": 61.92, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
61.92	0.0	
71.99	0.0001736	
83.7	0.0006061	
97.32	0.00138	
113.2	0.002608	
131.6	0.004402	
153.0	0.006828	
177.9	0.009868	
206.8	0.01339	
240.5	0.01718	
279.6	0.02097	
325.1	0.02454	
378.0	0.02773	
439.5	0.03048	
511.0	0.03279	
594.2	0.03468	
690.8	0.0362	
803.2	0.03741	
934.0	0.03834	
1086.0	0.03902	
1263.0	0.03947	
1468.0	0.03973	
1707.0	0.03979	
1985.0	0.03966	
2308.0	0.03935	
2683.0	0.03887	
3120.0	0.03822	
3627.0	0.03741	
4218.0	0.03645	
4904.0	0.03536	
5702.0	0.03414	
6629.0	0.03281	
7708.0	0.03138	
8962.0	0.02989	
10420.0	0.02834	
12120.0	0.02676	
14090.0	0.02515	
16380.0	0.02355	
19050.0	0.02197	
22140.0	0.02041	
25750.0	0.0189	
29940.0	0.01744	
34810.0	0.01604	
40470.0	0.01471	
47060.0	0.01345	
54710.0	0.01227	
63620.0	0.01116	
73970.0	0.01013	
86010.0	0.009167	
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