{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Rh", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Rh(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.4883, "q": 0.0174, "mu": 1.563, "epsilonL": 0.0001938, "Eth": 173.9}, "E_min": 173.9, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
173.9	0.0	
198.0	3.703e-05	
225.4	0.0001354	
256.6	0.0003119	
292.1	0.0005877	
332.6	0.0009793	
378.6	0.00149	
431.0	0.002105	
490.7	0.002786	
558.7	0.003484	
636.0	0.00415	
724.1	0.004745	
824.4	0.005251	
938.5	0.005661	
1068.0	0.005981	
1216.0	0.006221	
1385.0	0.006392	
1577.0	0.006504	
1795.0	0.006567	
2043.0	0.006588	
2326.0	0.006573	
2649.0	0.006525	
3015.0	0.00645	
3433.0	0.006349	
3908.0	0.006225	
4449.0	0.00608	
5065.0	0.005917	
5767.0	0.005738	
6565.0	0.005544	
7474.0	0.005338	
8509.0	0.005123	
9688.0	0.004899	
11030.0	0.00467	
12560.0	0.004438	
14290.0	0.004205	
16270.0	0.003971	
18530.0	0.00374	
21090.0	0.003513	
24010.0	0.00329	
27340.0	0.003074	
31130.0	0.002865	
35430.0	0.002664	
40340.0	0.002472	
45930.0	0.002288	
52290.0	0.002114	
59530.0	0.00195	
67770.0	0.001795	
77150.0	0.00165	
87840.0	0.001513	
-----