{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ru", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Ru(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.3912, "q": 0.0129, "mu": 1.674, "epsilonL": 0.0001995, "Eth": 194.7}, "E_min": 194.7, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
194.7	0.0	
221.1	3.054e-05	
251.2	0.0001205	
285.3	0.0002886	
324.0	0.0005544	
368.1	0.0009278	
418.1	0.0014	
474.9	0.00194	
539.4	0.002501	
612.6	0.003036	
695.9	0.00351	
790.4	0.003906	
897.8	0.004221	
1020.0	0.004462	
1158.0	0.00464	
1316.0	0.004765	
1494.0	0.004846	
1697.0	0.004892	
1928.0	0.004907	
2190.0	0.004896	
2487.0	0.004863	
2825.0	0.00481	
3209.0	0.004739	
3645.0	0.004651	
4140.0	0.004549	
4702.0	0.004434	
5341.0	0.004306	
6067.0	0.004168	
6891.0	0.004021	
7827.0	0.003866	
8890.0	0.003706	
10100.0	0.003541	
11470.0	0.003372	
13030.0	0.003202	
14800.0	0.003032	
16810.0	0.002863	
19090.0	0.002696	
21680.0	0.002531	
24630.0	0.002371	
27980.0	0.002216	
31780.0	0.002066	
36090.0	0.001922	
41000.0	0.001784	
46570.0	0.001653	
52890.0	0.001529	
60080.0	0.001411	
68240.0	0.0013	
77510.0	0.001196	
88040.0	0.001099	
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