{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Mo", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Mo(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2401, "q": 32.57, "mu": 1.669, "epsilonL": 1.179e-06, "Eth": 47.4}, "E_min": 47.4, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
47.4	0.0	
55.42	0.0002801	
64.79	0.00119	
75.74	0.003134	
88.55	0.006785	
103.5	0.01319	
121.0	0.02391	
141.5	0.04121	
165.4	0.06823	
193.4	0.1091	
226.1	0.1687	
264.3	0.2525	
309.0	0.3652	
361.2	0.5098	
422.3	0.6867	
493.6	0.8927	
577.1	1.122	
674.7	1.369	
788.7	1.627	
922.1	1.891	
1078.0	2.159	
1260.0	2.431	
1473.0	2.707	
1722.0	2.987	
2014.0	3.273	
2354.0	3.567	
2752.0	3.87	
3217.0	4.183	
3761.0	4.505	
4397.0	4.838	
5141.0	5.182	
6010.0	5.536	
7026.0	5.9	
8214.0	6.273	
9603.0	6.654	
11230.0	7.042	
13120.0	7.435	
15340.0	7.832	
17940.0	8.231	
20970.0	8.629	
24520.0	9.025	
28660.0	9.417	
33510.0	9.801	
39170.0	10.17	
45790.0	10.54	
53530.0	10.88	
62590.0	11.21	
73170.0	11.51	
85540.0	11.79	
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