{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Mo", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Mo(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.5124, "q": 0.0114, "mu": 1.147, "epsilonL": 0.0002119, "Eth": 201.5}, "E_min": 201.5, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
201.5	6.339e-22	
228.7	6.362e-05	
259.6	0.0001669	
294.6	0.0003117	
334.4	0.0005023	
379.6	0.000741	
430.9	0.001026	
489.1	0.001351	
555.1	0.001705	
630.1	0.002071	
715.2	0.002434	
811.7	0.002777	
921.4	0.003089	
1046.0	0.003361	
1187.0	0.00359	
1347.0	0.003773	
1529.0	0.003914	
1736.0	0.004015	
1970.0	0.00408	
2236.0	0.004112	
2538.0	0.004116	
2881.0	0.004094	
3270.0	0.00405	
3712.0	0.003987	
4213.0	0.003906	
4782.0	0.003811	
5428.0	0.003703	
6161.0	0.003585	
6993.0	0.003457	
7938.0	0.003322	
9010.0	0.003182	
10230.0	0.003037	
11610.0	0.00289	
13180.0	0.002742	
14950.0	0.002594	
16970.0	0.002446	
19270.0	0.002301	
21870.0	0.002159	
24820.0	0.002021	
28170.0	0.001887	
31980.0	0.001758	
36300.0	0.001634	
41200.0	0.001516	
46760.0	0.001404	
53080.0	0.001298	
60250.0	0.001197	
68380.0	0.001103	
77620.0	0.001014	
88100.0	0.0009315	
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