{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Cu", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Xe+ on Cu(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2781, "q": 24.46, "mu": 2.239, "epsilonL": 1.391e-06, "Eth": 23.63}, "E_min": 23.63, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
23.63	1.572e-38	
28.02	4.858e-05	
33.22	0.0003315	
39.39	0.001192	
46.71	0.003297	
55.39	0.007886	
65.69	0.01713	
77.89	0.03453	
92.36	0.06519	
109.5	0.1152	
129.9	0.19	
154.0	0.2911	
182.6	0.4147	
216.6	0.5528	
256.8	0.697	
304.5	0.8422	
361.1	0.9865	
428.2	1.131	
507.7	1.277	
602.0	1.428	
713.9	1.585	
846.6	1.75	
1004.0	1.924	
1190.0	2.109	
1412.0	2.305	
1674.0	2.513	
1985.0	2.733	
2354.0	2.966	
2791.0	3.211	
3309.0	3.468	
3924.0	3.736	
4653.0	4.016	
5518.0	4.306	
6543.0	4.605	
7759.0	4.913	
9201.0	5.228	
10910.0	5.548	
12940.0	5.872	
15340.0	6.198	
18190.0	6.524	
21570.0	6.848	
25580.0	7.167	
30330.0	7.478	
35970.0	7.78	
42650.0	8.069	
50580.0	8.342	
59970.0	8.596	
71120.0	8.828	
84330.0	9.034	
-----