{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Cu", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of (4He)+ on Cu(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1639, "q": 0.6376, "mu": 1.994, "epsilonL": 0.0001589, "Eth": 21.52}, "E_min": 21.52, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
21.52	0.0	
25.57	0.0003449	
30.38	0.001918	
36.09	0.005904	
42.88	0.0139	
50.94	0.02735	
60.53	0.04645	
71.91	0.06941	
85.43	0.09316	
101.5	0.1151	
120.6	0.1342	
143.3	0.1502	
170.2	0.1639	
202.2	0.1758	
240.2	0.1863	
285.4	0.1958	
339.1	0.2046	
402.9	0.2126	
478.6	0.2199	
568.6	0.2266	
675.6	0.2326	
802.6	0.2377	
953.6	0.242	
1133.0	0.2454	
1346.0	0.2478	
1599.0	0.2491	
1900.0	0.2493	
2257.0	0.2482	
2682.0	0.2459	
3186.0	0.2423	
3785.0	0.2375	
4497.0	0.2314	
5342.0	0.2242	
6347.0	0.2159	
7541.0	0.2068	
8959.0	0.1968	
10640.0	0.1862	
12650.0	0.1752	
15020.0	0.1639	
17850.0	0.1525	
21210.0	0.1412	
25190.0	0.13	
29930.0	0.1192	
35560.0	0.1088	
42250.0	0.09888	
50190.0	0.08951	
59630.0	0.08072	
70850.0	0.07255	
84170.0	0.065	
-----