{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ni", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Ni(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 1.349, "q": 20.87, "mu": 2.365, "epsilonL": 1.371e-06, "Eth": 21.27}, "E_min": 21.27, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
21.27	2.653e-41	
25.27	6.356e-06	
30.03	4.812e-05	
35.69	0.0001855	
42.41	0.0005441	
50.4	0.001376	
59.89	0.003168	
71.17	0.00683	
84.58	0.014	
100.5	0.02745	
119.4	0.05153	
141.9	0.09224	
168.7	0.1562	
200.4	0.2482	
238.2	0.3675	
283.1	0.5073	
336.4	0.6578	
399.7	0.8106	
475.0	0.9614	
564.5	1.11	
670.8	1.258	
797.2	1.408	
947.3	1.563	
1126.0	1.724	
1338.0	1.893	
1590.0	2.071	
1889.0	2.259	
2245.0	2.457	
2668.0	2.665	
3170.0	2.884	
3767.0	3.113	
4477.0	3.352	
5320.0	3.6	
6322.0	3.857	
7513.0	4.121	
8928.0	4.391	
10610.0	4.667	
12610.0	4.947	
14980.0	5.228	
17810.0	5.51	
21160.0	5.79	
25140.0	6.067	
29880.0	6.337	
35510.0	6.599	
42200.0	6.851	
50140.0	7.089	
59590.0	7.311	
70810.0	7.513	
84150.0	7.694	
-----