{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ni", "surface_phase": "pc", "species": {"text": "Ni+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Ni+ on Ni(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 6.57, "q": 11.81, "mu": 2.788, "epsilonL": 4.832e-06, "Eth": 11.75}, "E_min": 11.75, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
11.75	1.455e-48	
14.13	8.833e-07	
16.99	9.602e-06	
20.44	4.717e-05	
24.59	0.0001681	
29.58	0.0005041	
35.57	0.001357	
42.79	0.003391	
51.47	0.008009	
61.91	0.01802	
74.47	0.03858	
89.57	0.07795	
107.7	0.1462	
129.6	0.2495	
155.9	0.383	
187.5	0.5308	
225.5	0.6767	
271.3	0.8131	
326.3	0.9403	
392.5	1.062	
472.1	1.183	
567.8	1.305	
683.0	1.432	
821.6	1.563	
988.2	1.7	
1189.0	1.843	
1430.0	1.992	
1720.0	2.146	
2069.0	2.305	
2488.0	2.469	
2993.0	2.636	
3600.0	2.805	
4330.0	2.975	
5208.0	3.146	
6265.0	3.315	
7536.0	3.482	
9064.0	3.644	
10900.0	3.801	
13110.0	3.949	
15770.0	4.088	
18970.0	4.215	
22820.0	4.329	
27450.0	4.426	
33020.0	4.507	
39720.0	4.567	
47770.0	4.605	
57460.0	4.62	
69120.0	4.61	
83140.0	4.573	
-----