{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ni", "surface_phase": "pc", "species": {"text": "O+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of O+ on Ni(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2107, "q": 3.403, "mu": 2.23, "epsilonL": 3.139e-05, "Eth": 18.4}, "E_min": 18.4, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
18.4	7.165e-38	
21.93	0.0001718	
26.13	0.001172	
31.15	0.004201	
37.12	0.01146	
44.24	0.0265	
52.73	0.05391	
62.85	0.09754	
74.91	0.1574	
89.29	0.2279	
106.4	0.3011	
126.8	0.3706	
151.2	0.434	
180.2	0.4914	
214.8	0.5446	
256.0	0.5949	
305.1	0.6436	
363.6	0.6916	
433.4	0.7393	
516.5	0.7869	
615.6	0.8344	
733.8	0.8817	
874.5	0.9287	
1042.0	0.975	
1242.0	1.02	
1481.0	1.064	
1765.0	1.107	
2103.0	1.147	
2507.0	1.184	
2988.0	1.218	
3561.0	1.249	
4245.0	1.276	
5059.0	1.298	
6030.0	1.314	
7187.0	1.325	
8566.0	1.331	
10210.0	1.329	
12170.0	1.321	
14500.0	1.306	
17290.0	1.284	
20600.0	1.254	
24560.0	1.219	
29270.0	1.177	
34880.0	1.13	
41580.0	1.078	
49550.0	1.022	
59060.0	0.9628	
70390.0	0.902	
83900.0	0.8402	
-----