{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ni", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Ni(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.6039, "q": 0.0334, "mu": 2.012, "epsilonL": 0.0003573, "Eth": 72.9}, "E_min": 72.9, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
72.9	0.0	
84.48	2.479e-05	
97.9	0.0001333	
113.5	0.0003968	
131.5	0.0009122	
152.4	0.001779	
176.6	0.003047	
204.6	0.00465	
237.1	0.0064	
274.8	0.008068	
318.4	0.009489	
369.0	0.0106	
427.6	0.01143	
495.5	0.01202	
574.2	0.01242	
665.5	0.01269	
771.2	0.01284	
893.7	0.01291	
1036.0	0.01289	
1200.0	0.01282	
1391.0	0.01268	
1612.0	0.01249	
1868.0	0.01224	
2164.0	0.01195	
2508.0	0.01161	
2907.0	0.01123	
3368.0	0.01082	
3903.0	0.01037	
4523.0	0.009904	
5242.0	0.009416	
6074.0	0.008915	
7039.0	0.008406	
8158.0	0.007896	
9453.0	0.007388	
10960.0	0.006888	
12700.0	0.006399	
14710.0	0.005926	
17050.0	0.00547	
19760.0	0.005034	
22900.0	0.004619	
26530.0	0.004228	
30750.0	0.00386	
35630.0	0.003515	
41290.0	0.003194	
47850.0	0.002897	
55450.0	0.002621	
64260.0	0.002368	
74460.0	0.002135	
86290.0	0.001922	
-----