{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Cr", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Cr(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.3673, "q": 0.0405, "mu": 1.5, "epsilonL": 0.0004356, "Eth": 65.88}, "E_min": 65.88, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
65.88	0.0	
76.5	0.0001416	
88.84	0.000505	
103.2	0.001147	
119.8	0.002123	
139.1	0.003448	
161.5	0.005066	
187.6	0.006849	
217.8	0.008636	
253.0	0.01028	
293.8	0.0117	
341.1	0.01285	
396.1	0.01375	
460.0	0.01442	
534.2	0.0149	
620.3	0.01521	
720.3	0.01539	
836.5	0.01546	
971.3	0.01542	
1128.0	0.0153	
1310.0	0.01509	
1521.0	0.01481	
1766.0	0.01447	
2051.0	0.01406	
2382.0	0.01361	
2766.0	0.0131	
3212.0	0.01256	
3730.0	0.01198	
4331.0	0.01138	
5030.0	0.01077	
5841.0	0.01014	
6782.0	0.009517	
7876.0	0.008894	
9146.0	0.00828	
10620.0	0.007682	
12330.0	0.007102	
14320.0	0.006545	
16630.0	0.006014	
19310.0	0.005509	
22430.0	0.005033	
26040.0	0.004587	
30240.0	0.00417	
35120.0	0.003782	
40780.0	0.003423	
47360.0	0.003092	
54990.0	0.002787	
63860.0	0.002509	
74160.0	0.002254	
86110.0	0.002022	
-----