{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "V", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on V(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1705, "q": 0.2146, "mu": 1.423, "epsilonL": 0.0002108, "Eth": 29.09}, "E_min": 29.09, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
29.09	0.0	
34.35	0.0004825	
40.56	0.001675	
47.89	0.003794	
56.55	0.007094	
66.78	0.01174	
78.85	0.01769	
93.1	0.02464	
109.9	0.03211	
129.8	0.03955	
153.3	0.04654	
181.0	0.05284	
213.7	0.05837	
252.3	0.06316	
297.9	0.06727	
351.8	0.0708	
415.4	0.07382	
490.5	0.0764	
579.2	0.07857	
683.9	0.08036	
807.5	0.08177	
953.5	0.08281	
1126.0	0.08348	
1329.0	0.08376	
1570.0	0.08364	
1853.0	0.08313	
2188.0	0.0822	
2584.0	0.08088	
3051.0	0.07915	
3603.0	0.07705	
4254.0	0.0746	
5023.0	0.07183	
5931.0	0.06878	
7003.0	0.0655	
8270.0	0.06204	
9765.0	0.05844	
11530.0	0.05477	
13610.0	0.05107	
16080.0	0.0474	
18980.0	0.04378	
22410.0	0.04026	
26460.0	0.03687	
31250.0	0.03364	
36900.0	0.03057	
43570.0	0.02769	
51440.0	0.025	
60740.0	0.0225	
71720.0	0.02019	
84690.0	0.01807	
-----