{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "V", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on V(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.7528, "q": 0.0234, "mu": 1.77, "epsilonL": 0.0004601, "Eth": 79.71}, "E_min": 79.71, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
79.71	1.331e-31	
92.2	2.958e-05	
106.7	0.0001311	
123.4	0.0003448	
142.7	0.0007223	
165.1	0.001312	
190.9	0.002135	
220.9	0.003157	
255.5	0.004287	
295.5	0.005401	
341.9	0.006394	
395.4	0.007205	
457.4	0.007823	
529.1	0.008267	
612.0	0.008563	
708.0	0.008742	
818.9	0.008826	
947.3	0.008835	
1096.0	0.008781	
1268.0	0.008674	
1466.0	0.008522	
1696.0	0.00833	
1962.0	0.008104	
2269.0	0.007847	
2625.0	0.007563	
3036.0	0.007258	
3512.0	0.006936	
4063.0	0.006599	
4700.0	0.006253	
5436.0	0.005902	
6288.0	0.005549	
7274.0	0.005198	
8414.0	0.004851	
9733.0	0.004513	
11260.0	0.004184	
13020.0	0.003867	
15060.0	0.003564	
17430.0	0.003275	
20160.0	0.003002	
23320.0	0.002745	
26970.0	0.002503	
31200.0	0.002278	
36090.0	0.002069	
41740.0	0.001876	
48290.0	0.001697	
55850.0	0.001533	
64610.0	0.001382	
74740.0	0.001245	
86450.0	0.001119	
-----