{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ti", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Ti(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2234, "q": 12.99, "mu": 1.894, "epsilonL": 1.556e-06, "Eth": 39.64}, "E_min": 39.64, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
39.64	0.0	
46.51	9.343e-05	
54.57	0.000476	
64.03	0.001409	
75.13	0.003338	
88.15	0.006989	
103.4	0.01349	
121.4	0.0245	
142.4	0.04229	
167.1	0.0696	
196.1	0.1093	
230.0	0.1634	
269.9	0.2324	
316.7	0.3148	
371.6	0.4072	
436.0	0.5058	
511.6	0.6074	
600.3	0.7098	
704.3	0.8125	
826.4	0.9155	
969.7	1.02	
1138.0	1.125	
1335.0	1.234	
1566.0	1.346	
1838.0	1.462	
2157.0	1.583	
2530.0	1.708	
2969.0	1.839	
3484.0	1.974	
4088.0	2.114	
4796.0	2.259	
5628.0	2.408	
6603.0	2.56	
7748.0	2.717	
9091.0	2.875	
10670.0	3.036	
12520.0	3.198	
14690.0	3.361	
17230.0	3.523	
20220.0	3.684	
23720.0	3.842	
27830.0	3.996	
32660.0	4.146	
38320.0	4.289	
44960.0	4.425	
52760.0	4.553	
61900.0	4.67	
72640.0	4.775	
85230.0	4.867	
-----