{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Al", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Xe+ on Al(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.22, "q": 11.96, "mu": 1.98, "epsilonL": 1.775e-06, "Eth": 37.38}, "E_min": 37.38, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
37.38	2.27e-34	
43.91	8.228e-05	
51.59	0.0004491	
60.6	0.00139	
71.19	0.003406	
83.63	0.007332	
98.25	0.01448	
115.4	0.02679	
135.6	0.04686	
159.3	0.0777	
187.1	0.1221	
219.8	0.1813	
258.2	0.2548	
303.3	0.3394	
356.4	0.431	
418.6	0.5257	
491.8	0.6211	
577.7	0.7161	
678.7	0.8108	
797.3	0.9059	
936.6	1.002	
1100.0	1.101	
1293.0	1.203	
1518.0	1.309	
1784.0	1.418	
2096.0	1.533	
2462.0	1.651	
2892.0	1.775	
3397.0	1.903	
3991.0	2.036	
4688.0	2.172	
5508.0	2.313	
6470.0	2.457	
7601.0	2.603	
8929.0	2.752	
10490.0	2.902	
12320.0	3.053	
14480.0	3.203	
17010.0	3.353	
19980.0	3.5	
23470.0	3.644	
27570.0	3.784	
32390.0	3.919	
38050.0	4.046	
44700.0	4.166	
52510.0	4.277	
61680.0	4.377	
72460.0	4.465	
85120.0	4.539	
-----