{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Al", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Al(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.4138, "q": 0.0469, "mu": 1.618, "epsilonL": 0.0009441, "Eth": 30.22}, "E_min": 30.22, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
30.22	9.288e-29	
35.66	0.0001417	
42.07	0.0005699	
49.64	0.001403	
58.57	0.002752	
69.1	0.004637	
81.53	0.006923	
96.19	0.009344	
113.5	0.01161	
133.9	0.01354	
158.0	0.01506	
186.4	0.01618	
219.9	0.01698	
259.5	0.0175	
306.2	0.01781	
361.2	0.01795	
426.2	0.01793	
502.9	0.01779	
593.3	0.01753	
700.0	0.01718	
825.9	0.01673	
974.4	0.01619	
1150.0	0.01559	
1356.0	0.01492	
1600.0	0.01421	
1888.0	0.01345	
2228.0	0.01267	
2629.0	0.01187	
3101.0	0.01106	
3659.0	0.01027	
4317.0	0.009481	
5094.0	0.008719	
6010.0	0.007985	
7091.0	0.007285	
8367.0	0.006622	
9871.0	0.005999	
11650.0	0.005417	
13740.0	0.004876	
16210.0	0.004378	
19130.0	0.00392	
22570.0	0.003501	
26630.0	0.00312	
31420.0	0.002775	
37070.0	0.002463	
43740.0	0.002182	
51600.0	0.001929	
60880.0	0.001703	
71840.0	0.001502	
84760.0	0.001322	
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